ALD features superb step coverage performance. The SEM images show

Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels - Physical Chemistry Chemical Physics (RSC Publishing) DOI:10.1039/D0CP03358H

Color online AFM image of Pt ALD growth on a SiO 2 and b Al 2 O 3

A novel way to prepare PbZrO3 nanocomposite films for increasing electrical properties and energy storage performance - ScienceDirect

Nanomaterials, Free Full-Text

Frontiers Nanoscale Technologies in Highly Sensitive Diagnosis of Cardiovascular Diseases

S. Kudelka's research works Infineon Technologies, Neubiberg and other places

Cross sectional TEM images for step coverage of the RPALD SiNx film as

3D-printed microrobots from design to translation

Cross-sectional SEM image showing highly conformal step coverage of

SEM images of the surfaces at different number of ALD cycles on Si(100)

Uwe SCHROEDER, Senior Scientist, Dr., NaMLab GmbH, Dresden, Dielectrics

ALD: Atomic Layer Deposition – Precise and Conformal Coating for Better Performance

ALD - Atomic Layer Deposition Informations

PDF) Atomic Layer Deposition for advanced DRAM applications