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Many laser material processing applications require an optimized beam profile, e.g., ring shape or Top-Hat profiles with homogeneous intensity distribution. In this study, we show a beam shaping concept leading to a phase shifting element with binary height profile as well as a very low periodicity with near diffraction limited spot size. Further advantages of so-called Fundamental Beam Mode Shaping (FBS) elements are the simplified handling, and a high efficiency and homogeneity. The calculated height profile of FBS elements are transferred in fused silica substrates using a combination of microlithography technologies, reactive ion etching (RIE) and ion beam etching (IBE). The experiments demonstrated a linear relation between the etching depth after RIE and IBE. The optical evaluation of the manufactured FBS beam mode shaper confirmed the presented concept design.